Jian Tang Lab

Quantum Materials and Devices

1. Topological quantum materials

Direction 1 schematic

We explore the frontier where topology intersects with electron correlations in low-dimensional quantum materials and van der Waals heterostructures. By tuning electrostatic gating, layer stacking, twist angle, and proximity to ferromagnets or superconductors, we create and probe new quantum states arising from the interplay of symmetry, topology, electron interactions, lattice instabilities, and electron-phonon coupling, etc. Our goal is to uncover novel topological and correlated phases and to advance the understanding and control of emergent phenomena in a series of new quantum materials.

For instance, we recently discovered a dual quantum spin Hall insulator in monolayer TaIrTe4 (Nature 628, 515, 2024), arising from the interplay of its single-particle topology and density-tuned electron correlations close to low-energy van Hove singularities. The discovery of the dual QSH insulator introduces a new method for creating topological flat minibands through CDW superlattices, which offer a promising platform for exploring time-reversal-symmetric fractional phases. Moreover, we further uncovered the interaction-driven topological phase transition (arXiv:2506.18412) from a quantum spin Hall insulator to a trivial insulator, a higher-order topological insulator, and a metallic phase.

Wide schematic for Direction 1

Memory in materials is typically stored in charge or spin, as in ferroelectric and ferromagnetic systems. In monolayer TaIrTe4, we recently discovered a different possibility: memory encoded directly in the crystal lattice. A pristine monolayer can spontaneously develop a long-period superlattice upon "finite carrier doping and cooling" process. This superlattice can be electrically switched ON and OFF and remains stable after the field is removed — a nonvolatile spontaneous superlattice memory effect (Nature 2026, in press). The switching toggles the system between two structural configurations whose unit-cell areas differ by nearly two orders of magnitude.

This phenomenon arises from the interplay between lattice and QSH electronic instabilities, revealed through complementary probes including linear and nonlinear transport measurements, Raman spectroscopy, and STM. Switching the superlattice simultaneously reshapes the electronic topology, enabling control of topological flat bands and correlated electronic states. More broadly, this spontaneous superlattice memory effect suggests a new direction for quantum materials: programmable superlattices as an active handle to control topological and electronic correlated phases.

2. Controllable growth of 2D materials for electronics

Atomically thin 2D materials are promising candidates for next-generation integrated electronics owing to their exceptional mechanical and electrical properties. However, several critical challenges must be addressed before practical deployment, including material quality, contact engineering, device performance, device scaling and scalable fabrication, as well as power consumption, etc.

We have achieved controllable epitaxial growth of high-quality MoS2 wafers by chemical vapor deposition, featuring domain sizes exceeding 100 μm, excellent crystalline quality, tunable layer numbers (1L–3L) and stacking configurations, as well as controlled oxygen doping (Nano Lett. 2020; Small 2020; Natl. Sci. Rev. 2022). Building on this materials platform, we developed an ultrathin high-κ dielectric deposition technique (5 nm HfO2 with an equivalent oxide thickness of ~1 nm) and realized ohmic contacts with atomically sharp interfaces (Rc < 0.6 kΩ·μm). These advances enabled the fabrication of high-performance MoS2 thin-film transistors and large-scale flexible integrated logic circuits operating at low voltages (~0.5 V) and low power consumption (Nat. Commun. 2023). Collectively, these achievements represent a significant step toward the practical application of 2D electronics.

Wide schematic for Direction 2

3. Functional devices and applications

We develop nanoscale devices to ......